- Economic Impact
- Nano Network
Campus-shared photolithography facilities and thin-film deposition systems (including direct write laser lithography and focussed ion beam lithography) are used to create new devices. See an overview of the Oregon State University Owen Cleanroom.
OSU’s Heidleberg 66FS direct write lithography tool has been installed for nearly 2 years. The tool has been a great success, with more than 22 users.
External users include, Inpria, an ONAMI Gap Company, that is commercializing inorganic printed and spin-on materials for high-performance, low-cost printed electronics
OSU users come from 7 disciplines and 10 research groups:
For more information about how to access the Heidleberg 66FS and other tools in the Own Cleanroom, contact:
Direct Write Lithography exposes patterns in photoresist for microfabrication of electronic, photonic and micromechanical devices.
The figure below shows the mask writing process performed on the DWL and subsequent photolithography process.
The DWL 66FS is configured to support the following specifications: