Photolithography exposure cell
Facility: MBI

The photolithography cell is capable of SU-8 thick film processes (>50um capability) with feature sizes as small as 10um and 5:1 aspect ratio. Maximum 100mm diameter substrates.

Function
develop
expose
microchannels
photolithography
spin coat
SU-8

Technique
photolithography

Contact MBI

Name: Email: Phone: Reason: Note: Functions: develop expose microchannels photolithography spin coat SU-8 Techniques: photolithography