ONAMI | John Donovan


John Donovan

Director, Micro Analytical Facility, University of Oregon


Nanoscale Metrology and Nanoelectronics, Safer Nanomaterials and Nanomanufacturing


John Donovan is currently Director of the Microanalysis Facility in the Center for Advanced Materials Characterization for Oregon (CAMCOR) Facility at the University of Oregon. He is a world recognized expert in electron beam instruments including the electron microprobe and scanning electron microscope.

John specializes in the development of new quantitative techniques and algorithms to improve accuracy quantitatively at the micro and nano scales of both chemical information and spatial dimension. Recently his work has focussed on improving methods for accurately quantifying thin film chemistry using the electron microprobe. He is the author of several papers on various techniques for quantifying spectral interferences, modeling of background corrections and the atomic number effect in electron solid interactions. He has developed the most advanced software package (Probe for Windows) available for acquisition, automation and analysis on electron microprobes, which is used by over 60 leading research institutions and many commercial companies including Berkeley, Stanford, Corning, Westinghouse, Babcock & Wilcox, Battelle, Cal Tech, NASA and NIST.

    J. J. Donovan, D. A. Snyder and M. L. Rivers, “An Improved Interference Correction for Trace Element Analysis” Microbeam Analysis, 2: 23-28, 1993.
    J. J. Donovan and T. N. Tingle, “An Improved Mean Atomic Number Correction for Quantitative Microanalysis” in Journal of Microscopy and Microanalysis, v. 2, 1, p. 1-7, 1996.
    J. J. Donovan, N. E. Pingitore and A. N. Westphal, “Composition Averaging of Backscatter Intensities in Compounds”, Microscopy & Microanalysis, 2003, v. 9, 202-215.

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