ONAMI | John F Conley, Jr.



John F. Conley, Jr.

Professor, Oregon State University


Microtechnology-Based Energy and Chemical Systems, Nanolaminates and Transparent Electronics, Nanoscale Metrology and Nanoelectronics, Safer Nanomaterials and Nanomanufacturing


John F. Conley, Jr. received the B.S. in Electrical Engineering in 1991 and the Ph.D. in Engineering Science and Mechanics in 1995 from The Pennsylvania State University, where he won a 1996 Xerox Prize for his Ph.D. dissertation.

Dr. Conley was a Senior Member of the Technical Staff at Dynamics Research Corporation (Beaverton, OR and San Diego, CA) from 1995 to 2000 and at the Jet Propulsion Laboratory (Pasadena, CA) from 2000-2001. From 2001 until 2007, he was at Sharp Laboratories of America (Camas, WA) as a Senior Scientist in the IC Process Technology Laboratory and later as Leader of the Novel Materials and Devices Group in the LCD Process Technology Laboratory.

In 2002-03, he also served as an adjunct professor at Washington State University (Vancouver, WA). In Fall of 2007, he became a Professor in the Oregon State University School of Electrical Engineering and Computer Science.

Dr. Conley’s research interests include solid state materials and devices, directed assembly and device applications of nanomaterials, atomic layer deposition coating of nanomaterials, high-k dielectrics, sensors, reliability and radiation effects in novel electronic materials and devices, and the atomic structure of electrically active point defects. Dr. Conley has authored or co-authored over 90 technical papers and over 90 conference presentations (including several invited). He holds ten U.S. patents.

Dr. Conley is a Senior Member of the IEEE and has served on the technical and management committees of the IEEE Reliability Physics Symposium, the IEEE SOI Conference, and the IEEE Nuclear and Space Radiation Effects Conference. He was technical program chair of the 2000 IEEE Microelectronics Reliability and Qualification Workshop and in 2006 served as the General Program Chair of the IEEE International Integrated Reliability Workshop. He has presented short courses on high-k dielectrics at two international meetings and was recently a Guest Editor for IEEE Transactions on Device and Materials Reliability.

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John F.


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